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Senator commentator Th hard mask materials Controle hoekpunt Darmen

PDF) Impact of Sacrificial Hard Mask Material in BEOL Integration in Advanced Technology
PDF) Impact of Sacrificial Hard Mask Material in BEOL Integration in Advanced Technology

Si Hardmask (Si-HM), EUV And Zero Defects
Si Hardmask (Si-HM), EUV And Zero Defects

Alpha Carbon Hardmask in 3D-NAND Device Manufacturing Characterization by Multiple Metrology Methods for In-Line Control of High Aspect Ratio Etching - Onto Innovation
Alpha Carbon Hardmask in 3D-NAND Device Manufacturing Characterization by Multiple Metrology Methods for In-Line Control of High Aspect Ratio Etching - Onto Innovation

Development of a facile block copolymer method for creating hard mask patterns integrated into semiconductor manufacturing | SpringerLink
Development of a facile block copolymer method for creating hard mask patterns integrated into semiconductor manufacturing | SpringerLink

PDF] Chromium oxide as a hard mask material better than metallic chromium | Semantic Scholar
PDF] Chromium oxide as a hard mask material better than metallic chromium | Semantic Scholar

Precision micro-mechanical components in single crystal diamond by deep reactive ion etching | Microsystems & Nanoengineering
Precision micro-mechanical components in single crystal diamond by deep reactive ion etching | Microsystems & Nanoengineering

KR20160110657A - Polymer for hard mask, hard mask composition including the polymer, and method for forming pattern of semiconductor device using the hard mask composition - Google Patents
KR20160110657A - Polymer for hard mask, hard mask composition including the polymer, and method for forming pattern of semiconductor device using the hard mask composition - Google Patents

In situ” hard mask materials: a new methodology for creation of vertical silicon nanopillar and nanowire arrays - Nanoscale (RSC Publishing)
In situ” hard mask materials: a new methodology for creation of vertical silicon nanopillar and nanowire arrays - Nanoscale (RSC Publishing)

BALD Engineering - Born in Finland, Born to ALD: Applied Materials Introduces Materials Engineering Solutions for DRAM Scaling
BALD Engineering - Born in Finland, Born to ALD: Applied Materials Introduces Materials Engineering Solutions for DRAM Scaling

Etching characteristics of TiN used as hard mask in dielectric etch process: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena: Vol 24, No 5
Etching characteristics of TiN used as hard mask in dielectric etch process: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena: Vol 24, No 5

New silicon hard mask material development for sub-5nm node
New silicon hard mask material development for sub-5nm node

Microwaves101 | Photolithography 101
Microwaves101 | Photolithography 101

Conversion of a Patterned Organic Resist into a High Performance Inorganic Hard Mask for High Resolution Pattern Transfer | ACS Nano
Conversion of a Patterned Organic Resist into a High Performance Inorganic Hard Mask for High Resolution Pattern Transfer | ACS Nano

Progress in Spin-on Hard Mask Materials for Advanced Lithography | Semantic Scholar
Progress in Spin-on Hard Mask Materials for Advanced Lithography | Semantic Scholar

Spin on Hard-Mask Material - diagram, schematic, and image 08
Spin on Hard-Mask Material - diagram, schematic, and image 08

Spin-on Dual Hard Mask Material | JSR Micro, Inc.
Spin-on Dual Hard Mask Material | JSR Micro, Inc.

Progress in Spin-on Hard Mask Materials for Advanced Lithography | Semantic Scholar
Progress in Spin-on Hard Mask Materials for Advanced Lithography | Semantic Scholar

Analytics for US Patent No. 6472107, Disposable hard mask for photomask plasma etching
Analytics for US Patent No. 6472107, Disposable hard mask for photomask plasma etching

Semiconductor Process Materials|Semiconductor material: etc
Semiconductor Process Materials|Semiconductor material: etc

PDF) Sub-100 nm silicon-nitride hard-mask for high aspect-ratio silicon fins
PDF) Sub-100 nm silicon-nitride hard-mask for high aspect-ratio silicon fins

Improvement of high resolution lithography by using amorphous carbon hard mask - ScienceDirect
Improvement of high resolution lithography by using amorphous carbon hard mask - ScienceDirect

Integrated process feasibility of hard-mask for tight pitch interconnects fabrication (MEMS and Nanotechnology)
Integrated process feasibility of hard-mask for tight pitch interconnects fabrication (MEMS and Nanotechnology)

Spin-on Dual Hard Mask Material | JSR Micro, Inc.
Spin-on Dual Hard Mask Material | JSR Micro, Inc.

Innovatively composite hard mask to feature sub-30 nm gate patterning - ScienceDirect
Innovatively composite hard mask to feature sub-30 nm gate patterning - ScienceDirect

Integrated process feasibility of hard-mask for tight pitch interconnects fabrication (MEMS and Nanotechnology)
Integrated process feasibility of hard-mask for tight pitch interconnects fabrication (MEMS and Nanotechnology)

Semiconductor Process Materials|Semiconductor material: etc
Semiconductor Process Materials|Semiconductor material: etc

Etching with a hard mask - Plasma Etching - Texas Powerful Smart
Etching with a hard mask - Plasma Etching - Texas Powerful Smart